Electron beam technologies, vacuum thin film deposition techniques and technologies for organic electronics, microdisplay technology and sensorics.
The Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP is one out of 76 institutes and research units of the Fraunhofer-Gesellschaft e. V., the largest European institution for applied research. The core competences of Fraunhofer FEP are electron beam technologies, vacuum thin film deposition techniques and technologies for organic electronics, microdisplay technology and sensorics. Main activities target development and adaption of the thin film deposition technologies to a wide range of industrial applications. Fraunhofer FEP runs multiple pilot scale vacuum coating systems.
Furthermore, Fraunhofer FEP has a unique position in designing microelectronic circuits and components with application- and customer-specific adaptations of silicon circuit foundries’ CMOS processes that allow these finished wafers to be subsequently processed with OLED coatings, for example. This subsequent processing is used in particular for augmenting silicon CMOS wafer functionality with optical and photonic components, such as for high-resolution OLED microdisplays.